A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)

Wasim Haskiya

doi:doi:10.11648/j.nano.20130102.11

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A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)

Wasim Haskiya

Published in American Journal of Nanoscience and Nanotechnology (Volume 1, Issue 2)

Received: 2 May 2013 Published: 10 July 2013

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Abstract

The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.

Published in	American Journal of Nanoscience and Nanotechnology (Volume 1, Issue 2)
DOI	10.11648/j.nano.20130102.11
Page(s)	46-51
Creative Commons	This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.
Copyright	Copyright © The Author(s), 2013. Published by Science Publishing Group

Keywords

Nanomanufactiring, FIB, Metal Organic Gas, Outline Features, Precursor Flux

References

[1]	Marc J. Madou, Fundamentals of microfabrication – the science of miniaturization, CRC Press, Second eddition
[2]	Edward L. Wolf, Nanophysics and nanotechnology: An introduction to modern concepts in nanoscience, Physics textbook, WILEY-VCH
[3]	Michael Rieth, Nano-engineering in science and technology: an introduction to the world of nano design, World scientific, Vol. 6
[4]	Stanley Humphries, Jr., Charged particle beams, Originally published in1990 by John Wiley and Sons (QC786.H86 1990, ISBN 0-471-60014-8)
[5]	John Melngailis, Focused ion beam fabrication of microelectronic structures, Final report – U.S. Army Research office Contract DAALO3-87-K-0126, Research Laboratory of Electronics Massachusetts Institute of Technology
[6]	Fabio Cicoira, Electron beam induced deposition of rhodium Nanostructures, École Polytechnique Fédérale De Lausanne, Thèse No 2528 (2002)
[7]	Yongqi Fu, Ngoi Kok, Ann Bryan, Ong Nan Shing, Characterization of focused ion beam induced deposition process and parameters calibration, Elsevier Sensors and actuators A 88 (2001) 58-66
[8]	Joon Hyun Kim, Youn-Jea Kim, Influence of stage control parameters on pattering in the focused ion beam deposition process, Journal of the Korean Physical Society, Vol. 53, (Nov. 2008), 2596-2602
[9]	B. W. Kemshall, L. A. Giannuzzi, B. I. Prenitzer, F. A. Stevie, S. X. Da, Comparative evaluation of protective coatings and focused ion beam chemical vapor deposition process, Journal of the American Vacuum Society, B20(1), Jan/Feb 2002, 286-290
[10]	Jack Zhou, Guoliang Yang, Focused ion beam based nanohole modeling, simulation, fabrication, and application, Journal of manufacturing science and engineering, Vol. 132, Feb 2010, 011005-1 to 011005-8 (Transactions of the ASME)
[11]	Jerome J. Cuomo, Stephen M. Rossnagel, Harold R. Kaufman, Handbook of ion beam processing technology – principles, deposition, film modification and synthesis, Noyes publications
[12]	Ivo Utke, Pattrick Hoffmann, John Melngailis, Gas-assisted focused electron beam and ion beam processing and fabrication, J. Vac. Sci. Technol. B, Vol. 26, No. 4, Jul/Aug 2008, 1197-1276
[13]	Francis L. Ross III, Nano-cellural microstrtucture evolution in ion induced chemical vapour deposition (II-CVD) of copper, Submitted to the department of material science and engineering in fulfillment of the requirement of the degree Doctor of Philosophy at the, Massachusetts Institute of Technology, Sep. 2003
[14]	Jon Orloff, Handbook of charged particle optics, second edition, CRC Press
[15]	Edited by: Bernhard Wolf , Handbook of Ion sources, CRC

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APA Style

Wasim Haskiya. (2013). A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). American Journal of Nano Research and Applications, 1(2), 46-51. https://doi.org/10.11648/j.nano.20130102.11

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ACS Style

Wasim Haskiya. A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). Am. J. Nano Res. Appl. 2013, 1(2), 46-51. doi: 10.11648/j.nano.20130102.11

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AMA Style

Wasim Haskiya. A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). Am J Nano Res Appl. 2013;1(2):46-51. doi: 10.11648/j.nano.20130102.11

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@article{10.11648/j.nano.20130102.11,
  author = {Wasim Haskiya},
  title = {A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)},
  journal = {American Journal of Nano Research and Applications},
  volume = {1},
  number = {2},
  pages = {46-51},
  doi = {10.11648/j.nano.20130102.11},
  url = {https://doi.org/10.11648/j.nano.20130102.11},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.nano.20130102.11},
  abstract = {The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.},
 year = {2013}
}

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TY  - JOUR
T1  - A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)
AU  - Wasim Haskiya
Y1  - 2013/07/10
PY  - 2013
N1  - https://doi.org/10.11648/j.nano.20130102.11
DO  - 10.11648/j.nano.20130102.11
T2  - American Journal of Nano Research and Applications
JF  - American Journal of Nano Research and Applications
JO  - American Journal of Nano Research and Applications
SP  - 46
EP  - 51
PB  - Science Publishing Group
SN  - 2575-3738
UR  - https://doi.org/10.11648/j.nano.20130102.11
AB  - The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.
VL  - 1
IS  - 2
ER  -

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Author Information

Wasim Haskiya

Irish Robotics Academy, Ireland

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APA Style

Wasim Haskiya. (2013). A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). American Journal of Nano Research and Applications, 1(2), 46-51. https://doi.org/10.11648/j.nano.20130102.11

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ACS Style

Wasim Haskiya. A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). Am. J. Nano Res. Appl. 2013, 1(2), 46-51. doi: 10.11648/j.nano.20130102.11

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AMA Style

Wasim Haskiya. A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). Am J Nano Res Appl. 2013;1(2):46-51. doi: 10.11648/j.nano.20130102.11

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@article{10.11648/j.nano.20130102.11,
  author = {Wasim Haskiya},
  title = {A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)},
  journal = {American Journal of Nano Research and Applications},
  volume = {1},
  number = {2},
  pages = {46-51},
  doi = {10.11648/j.nano.20130102.11},
  url = {https://doi.org/10.11648/j.nano.20130102.11},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.nano.20130102.11},
  abstract = {The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.},
 year = {2013}
}

Copy | Download

TY  - JOUR
T1  - A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)
AU  - Wasim Haskiya
Y1  - 2013/07/10
PY  - 2013
N1  - https://doi.org/10.11648/j.nano.20130102.11
DO  - 10.11648/j.nano.20130102.11
T2  - American Journal of Nano Research and Applications
JF  - American Journal of Nano Research and Applications
JO  - American Journal of Nano Research and Applications
SP  - 46
EP  - 51
PB  - Science Publishing Group
SN  - 2575-3738
UR  - https://doi.org/10.11648/j.nano.20130102.11
AB  - The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.
VL  - 1
IS  - 2
ER  -

Copy | Download